January 10, 2011
Albany, NY and TOKYO - January 10, 2011 – SEMATECH, a global consortium of chipmakers, and Nissan Chemical Industries, Ltd., (NCI) a Japanese chemical company supplying cutting-edge products in fields including electronic materials, today announced it has joined SEMATECH’s Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.
NCI will collaborate with SEMATECH engineers on advanced adhesion enhancing materials in extreme ultraviolet (EUV) lithography. Specific areas include reduction of line edge roughness (LER), elimination of pattern collapse in images below 22 nm, and ultimate resolution of new resists.
“The leading-edge research in EUVL technology at CNSE’s Albany NanoTech Complex will be strengthened by the addition of NCI,” said Richard Brilla, CNSE vice president for strategy, alliances and consortia. “This further builds the world-class capabilities at the UAlbany NanoCollege, and demonstrates the success of the SEMATECH-CNSE partnership in establishing collaborations to accelerate the advanced technologies driving the nanoelectronics industry.”