April 12, 2007
By: by MSN Money, BizJournals
Researchers at Sematech North say they have reached a significant milestone in reducing certain defects in mask blanks -- or negatives -- used for extreme ultraviolet lithography (EUVL), bringing that technology closer to advanced manufacturing.
Sematech technologists have detected and cleaned 10-nanometer particles from mask blanks. Sematech, a consortium of computer chip manufactures, is based in Austin, Texas. Sematch said the success of extreme ultraviolet lithography depends on the ability to detect and remove particles at 10 nanometers. A single nanometer is 40,000 times smaller than the width of a human hair.
Abbas Rastegar, senior member of the technical staff at Sematech's Mask Blank Development Center, said a 10-nm particle is so small that 100,000 of them could fit on the head of a pin. But particles even this small can impact the patterns that are used to define the circuits and devices in microchips.
Sematech North is located at the state University at Albany's College of Nanoscale Science and Engineering.