News

February 27, 2007

UAlbany Nanocollege Reports Breakthrough In Production Of Exposed Images Using ASML EUV R&D Lithography Tool

By: by Steve Janack, Director of Communications, CNSE

Source:

Albany, NY - Less than six months after taking delivery of the world's first full-field extreme ultraviolet ("EUV") research and development tool ("ADT"), the College of Nanoscale Science and Engineering ("CNSE") of the University at Albany today announced that it has produced the world's first exposed images while using the tool in a development environment.

The announcement came during a presentation at the International Society for Optical Engineering ("SPIE") Advanced Lithography 2007 conference in San Jose, CA.

The $65 million EUV ADT, developed by Netherlands-based ASML Holding NV ("ASML"), the leading global supplier of advanced lithography tools, will be essential in development of the infrastructure for EUV lithography, considered the most likely technology for insertion into manufacturing as early as the 32nm computer chip device node, based on cost-effectiveness and ability to extend to future nodes, according to ASML.

The production of images from the EUV ADT supports the R&D programs of the $600M International Venture for Nanolithography ("INVENT"), a global industry-university consortium for R&D, education and technology deployment for future generations of nanolithography applications. INVENT was created with critical support and enabling assistance from the New York State Assembly, led by Speaker Sheldon Silver, and includes the world's leading computer-chip manufacturers: Advanced Micro Devices ("AMD"), IBM, Micron Technology and Qimonda.  Other global corporate partners of CNSE, including SONY and Toshiba, also participate in the CNSE EUV programs. 

"This is an exciting development not only for the College of Nanoscale Science and Engineering, but also for the New York State Assembly. This groundbreaking achievement speaks volumes about the college's highly skilled team of scientists and technicians and the potential economic and job-development opportunities we can expect from the Assembly's investment in this revolutionary technology," said Assembly Speaker Sheldon Silver.

"This milestone is a testament to the leadership of Speaker Silver and Dr. Kaloyeros and it is especially rewarding for all of us in the Assembly Majority to be such an instrumental part of this innovative process that is sure to solidify Tech Valley's position as a leader driving the field of nanoscience," said Assembly Majority Leader Ron Canestrari.

"Today's successful demonstration of the EUV tool by the College of Nanoscale Science and Engineering holds much promise for our region of the state and its residents. We look forward to additional announcements on improving our economy and employment opportunities and building on today's impressive high-tech achievement," said Assemblyman Jack McEneny.

"This latest achievement of the College of Nanoscale Science and Engineering again confirms the status of the university and its governmental and private partners as worldwide leaders in nanoelectronics. In addition, it continues to demonstrate the critical movement from research to viable manufacturing, which confirms the viability of our investment," said Assemblyman Robert Reilly.

"The production of the world's first EUV images using the ASML R&D tool in a development environment is proof positive that the UAlbany NanoCollege and New York State are providing global leadership that is not only attracting the world's leading nanoelectronics companies and the industry's cutting-edge tools, but more importantly, allowing both to succeed," said Dr. Alain E. Kaloyeros, Vice President and Chief Administrative Officer of CNSE. "This breakthrough underscores the innovative research being conducted through a host of programs at CNSE, as typified by our global INVENT consortium, a vision of Speaker Silver, Assemblyman Canestrari, Assemblyman McEneny, Assemblyman Reilly and the New York Assembly, which is providing important scientific discovery, critical workforce education and training, and a strong lure to attract additional nanoelectronics jobs, companies and investment to New York State."

"The UAlbany NanoCollege has taken another step forward as the world's first educational and research institution to produce images with the EUV Alpha Demo Tool, in the process providing a critical advance toward the commercialization of EUV technology," said Dr. James Ryan, Professor of Nanoscience and Associate Vice President of Technology at CNSE. "Combined with the availability of EUV photomasks, ASML's earlier demonstration of operating wafer and reticle stages in a vacuum environment and the presence of a critical mass of nanoelectronics tool suppliers and chip manufacturers at CNSE, we look forward to leading the way in the development and commercialization of EUV technology."

ASML has a $400 million R&D center at the New York State Center of Excellence in Nanoelectronics and Nanotechnology at CNSE's Albany NanoTech complex  - the International Multiphase Partnership for Lithography Science and Engineering ("IMPLSE") - designed to develop nanoscale lithography technologies for future generations of nanochips. The establishment of the ASML R&D Center represents ASML's only 300mm wafer R&D facility located outside of its main headquarters in the Netherlands. 

About CNSE. The UAlbany CNSE is the first college in the world dedicated to research, development, education, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics.  In May 2006, it was ranked as the nation's number one college for nanotechnology and microtechnology in the Annual College Ranking by Small Times magazine. CNSE's Albany NanoTech complex is the most advanced research facility of its kind at any university in the world: a $3.5 billion, 450,000-square-foot complex that attracts corporate partners from around the world and offers students a one-of-a-kind academic experience. The UAlbany NanoCollege houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 65,000 square feet of Class 1 capable cleanrooms.    Over 1,600 scientists, researchers, engineers, students, and faculty work on site at CNSE's Albany NanoTech complex, including IBM, AMD, SONY, Toshiba, Qimonda, Honeywell, ASML, Applied Materials, Tokyo Electron, and Freescale.  An expansion currently underway will increase the size of CNSE's Albany NanoTech complex to over 750,000 square feet, including over 80,000 square feet of Class 1 cleanroom space, to house over 2,000 scientists, researchers, engineers, students, and faculty by the end of 2008.  For more information, visit http://www.cnse.albany.edu/.