News

January 23, 2007

Vistec's E-Beam Unit Gains U.S. Grant

By: by Mark LaPedus, EE Times

Source:

SAN JOSE, Calif. - The New York State Office of Science, Technology and Academic Research has awarded a grant of $750,000 to the College of Nanoscale Science and Engineering (CNSE) of the University at Albany to support a joint research initiative with Vistec Lithography Inc. in the field of electron-beam technology.

Under the plan, the joint CNSE-Vistec Center for Nanolithography Development aims to accelerate development and commercialization of the company's e-beam lithography technology for the production of integrated circuits at the nanoscale level.

With new product lines that include 300-mm wafer technology, Vistec is targeting a host of emerging business applications, including nano and bioelectronics, telecommunications, aerospace and defense markets, in a growing global market currently valued at $400 million.

Papken DerTorossian, president and chairman of Vistec Lithography Inc., said the deal would boost the company's efforts in e-beam lithography.

''The funding will play an important role in advancing Vistec's technology and business,'' he said in a statement. ''Working with our partners at the UAlbany NanoCollege and the Arsenal Partnership, this award will allow Vistec to bring its technology to market more quickly and help to build the skilled workforce we need for future growth.''

Recently, the New York State Assembly provided $30 million to relocate Vistec Lithography's global headquarters, R&D, manufacturing and business operations from Cambridge, U.K., to Watervliet, N.Y.

Vistec (Wetzlar, Germany), which was formerly known as Leica Microsystems GmbH, is now owned by a private-equity firm.