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CNSE Professor Dr. Alain Diebold honored as SPIE Fellow at 2013 Advanced Lithography conference

CNSE Professor Dr. Alain Diebold honored as SPIE Fellow at 2013 Advanced Lithography conference

CNSE Empire Innovation Professor of Nanoscale Science;
Executive Director, Center for Nanoscale Metrology;
Executive Director, NC3;
and SPIE Fellow Dr. Alain Diebold
Cutting-edge research conducted by Dr. Alain Diebold at the SUNY College of Nanoscale Science and Engineering (CNSE) has led to his being named as a Fellow of SPIE, an international society that is focused on advancing emerging technologies through interdisciplinary information exchange, continuing education, and career and professional growth.

Dr. Diebold is a CNSE Empire Innovation Professor of Nanoscale Science and Executive Director of the Center for Nanoscale Metrology at CNSE. The Fellowship highlights his dedication to advancing optical metrology methods to improve the nanoelectronics fabrication process.

The recognition came on February 25, 2013 during the SPIE 2013 Advanced Lithography conference in San Jose, CA.

“I am grateful to be named as an SPIE Fellow for this important area of research,” said Dr. Diebold. “Metrology is used every day in the world-class cleanrooms at the Albany NanoTech Complex, as CNSE’s researchers and corporate partners create the next generation of computer chips. For me, the exciting part is being able to help lay the groundwork for these advances by coming to a better understanding of the properties of matter at the nano level.”

Dr. Diebold’s work is also helping the nanoelectronics industry keep pace with Moore’s Law, which predicts a doubling of transistors on computer chips every two years. As researchers obtain higher efficiencies by making transistors smaller and smaller, certain challenges have arisen, including the fact that materials can behave very differently at the atomic level.

“Scientists and the companies making the new materials and structures that are used in the chip fabrication process are seeing changes in properties that they don’t understand,” explains Dr. Diebold. “Our work aims to provide some answers to many of these challenging questions by finding a more concrete way to understand the true behaviors of materials that are essential for the development of faster, more efficient computer chips.”

SPIE has recently published several research papers by Dr. Diebold, where, in collaboration with other researchers, he discussed investigations into novel metrology methods. This includes research into E-beam patterned nanostructures using Mueller Matrix-based Scatterometry, allowing for characterization of nano-scaled structures and control of their critical dimensions. This information can lead to innovative methodologies to improve nanoelectronics manufacturing.

Additionally, Dr. Diebold’s research group continues to utilize metrology methods to extend the competitive advantage of current CMOS-based computer chips, while concurrently evaluating materials that could be used in post-CMOS devices. Under the professor’s direction, they are also researching the optical properties of materials that exhibit quantum confinement, excitons, and other phenomena in nanoscale materials and structures, in order to push the boundaries of semiconductors as they continue to evolve.

Dr. Diebold also advises CNSE graduate student Gangadhara Raja Muthinti, who received the Best Student Paper award during a ceremony at the SPIE Conference Metrology, Inspection, and Process Control for Microlithography XXVII. A panel of judges from academia, industry, and government singled out his paper, “Mueller-based scatterometry measurement of nanoscale structures with anisotropic in-plane optical properties,” for technical merit and presentation quality. Muthinti, from Kakinada, India, is currently studying Nanoscale Engineering at CNSE.

Dr. Diebold also serves as Executive Director of the New York Center for National Competitiveness in Nanoscale Characterization (NC3), a world-class center created to formulate and deploy nanotechnology metrology innovations, enabling commercialization within small, medium, and large U.S. companies to further strengthen technological and business competitiveness in the United States. He is an AVS Fellow and a Senior member of IEEE. Contributing to numerous publications and conferences, Dr. Diebold gave the keynote address at the 25th anniversary of the Metrology Conference at SPIE Advanced Lithography in 2011.

In addition, he teaches graduate-level courses at CNSE, including Optical Processes in Nanoscale Solids, providing a theoretical overview of the optical properties of solids and the experimental methods used to characterize them; and Semiconductor Metrology, a detailed overview of current characterization methods that are critical to transistor fabrication, on-chip interconnection, lithography, defect detection and characterization, and process yield analysis.

Dr. Diebold is one of 69 new SPIE members of distinction to be promoted as a Fellow in 2013, an honor highlighting technical achievements and service to the general optics community, as well as service to the society. He joins the more than 1,000 SPIE members who have become Fellows since 1955.