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International Venture for Nanolithography (INVENT)

The International Venture for Nanolithography (INVENT) initiative is a first-of-its-kind, global industry-university consortium for research and development, education and technology deployment for future generations of nanolithography applications at SUNY Poly CNSE.

This new, highly synergistic approach will accelerate product development and quicken the time to market, making New York’s statewide high-tech economy more competitive than ever. The new initiative will also establish SUNY Poly CNSE as the premier institution of higher education in the field of nanotechnology and as a national leader in industry-university alliances for training the high-tech work force of the 21st century.


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