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Microsystems

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Microfluidics

Case Number Disclosure Title Inventor(s)
RN2-09-14 Cell Collecting Devices and Methods for Collecting Cells Castracane, James
RN2-09-01A Spatial Tuneable Pressure Plates for bonding wafer to wafer/die to wafer applications Altemus, Bruce
RN2-09-01 Piezoelectric Sensor Array for Pressure Uniformity/Spatial Verification Altemus, Bruce
R2-08-18 Fluidic Devices for Cell Encapsulation and methods of Making Same of Biological applications Bergkvist, Magnus; Cady, Nathaniel; Gracias, Allison; Xie, Yubing
R2-08-14 Porous Micro-Heater for Surface Dusruption and Controllled Sampling of Fluids Gadre, Anand
R2-08-10 Nano/Viral Sensor Conjugated Polymeric Non-Invasive Nanosensor for Viral Dectection Gadre, Anand
R2-08-09 Sticksensor Minimally invasive nanosensor for Continuous Monitoring of Bioanalysis Gadre, Anand
R2-08-06 Polymeric Micro-Cantilevers for Ultra-Low Volume Fluid and Living Cell Deposition Cady, Nathaniel C. ;Bergkvist Magnus; Gracias, Allison
R2-07-24 High-throughput Nanoscal Immunoassay Platform Tenenbaum, Scott
R2-06-05 Fluorinative Treatment of Polymer Electrolyte of Membranes for Fuel Cell Applications Welch, Jonh T.; Lim, Donsung; Higashiya, Selichiro; Geer, Robert
R2-05-10 Synthesis of Engineered Nanoarrays of Platium Based metal for fuel cell applications Haldar, Pradeep; Choi, Pyoungho; Paschos, Odysseas
R2-05-01 Flow Control Mechanism for Immersion Lithography Hartley, John G.
R2-01-04 High-throughput patterning of particles and molecules by hydrophobicity Yau, Sin-Tung
R2-01-01 Differential Mass Flow Control System for delivery of low volitility compounds Stoner,Timothy
R2-03-06 Novel biosensor using living cells on silicon-based microarrays Castracane, James

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Microsystems

Case Number Disclosure Title Inventor(s)
R99-04-320 MEMS Device for Interconnect Applications
Castracane, James
RN2-09-02 nMOS-Junction Logic Design Wang, Wei
RN2-09-01A Spatial Tuneable Pressure Plates for bonding wafer to wafer/die to wafer applications Altemus, Bruce
RN2-09-01 Piezoelectric Sensor Array for Pressure Uniformity/Spatial Verification Altemus, Bruce
R741-320 Low-Temperature Metal-Organic Chemical Vapor Deposition (Ltmocvd) of Copper for Microelectronic Device Applications Kaloyeros, Alain E.; Toscano, Paul J.; Corbett, James W.
R2-08-22 Reconfigurable 3d TSV technology for defense applications Wang, Wei
R2-08-21 Multi-value resistive memory by utilizing metallic and ionic filaments in parrallel Wang, Wei
R2-08-18 Fluidic Devices for Cell Encapsulation and methods of Making Same of Biological applications Bergkvist, Magnus; Cady ,Nathaniel; Gracias, Allison; Xie, Yubling
R2-08-16 Split gate method for MOSFET Wang, Wei; Hartley, John
R2-08-14 Porous Micro-Heater for Surface Dusruption and Controllled Sampling of Fluids Gadre, Anand
R2-08-10 Nano/Viral Sensor Conjugated Polymeric Non-Invasive Nanosensor for Viral Dectection Gadre, Anand
R2-08-09 Sticksensor Minimally invasive nanosensor for Continuous Monitoring of Bioanalysis Gadre, Anand
R2-08-08 Automated Determination of Height and Tilt of a Substrate Surface Within a Lithography System Ruan, Junru
R2-08-06 Polymeric Micro-Cantilevers for Ultra-Low Volume Fluid and Living Cell Deposition Cady, Nathaniel C. ;Bergkvist Magnus; Gracias, Allison
R2-08-05 Three-Dimensional Architecture for Integration of CMOS Circuits and Nano-Material in Hybrid Digital Circuits Wang, Wei
R2-08-02 FPGA Based on Integration of CMOS and RRAM circuits Wang, Wei
R2-06-15 Direct Closed Loop Proportional-Integral- Derivaive (PID) Substraite Temperature Control for a Molecular Beam Epilaxy (MBE) Machine Via Input from a Band-Edge temperature measurement system LaBella, Vincent; Awo-Affouda, Chaffra; Stollenwerk, Andrew
R2-06-06 w/ R2-06-07 combined in Detuned Duo-Cavity Laser-Modulator Device and Method with Detuning Selected to Minimize Change in Reflectivity Oktyabrsky, Serge; Tokranov, Vadim; Yakimov, Michael;van Eisden, Jobert; Mohammed, Edris (Intel); Young, Ian (Intel)
R2-04-07 Mechanical Phase repair in a Multilayer Denbeaux, Gregory
R2-03-09 Harsh compatable gate material for GaN or SiC Chemical sensor devices Carpenter, Michael A.
R2-03-08 Optical Methods and Systems for Detecting a Constituent in a Gas Containing Oxygen in Harsh Environments Carpenter, Michael A.
R1125-320.2 Passivated Copper Conductive Layers for Microelectronic Applications and methods of manufacturing same Wang, Wei; Lanford, William ; Ding, Peijun
R1125-320.1 Passivated Copper Conductive Layers for Microelectronic Applications and methods of manufacturing same Wang, Wei; Lanford, William ; Ding, Peijun
R2-07-03 Highly multiplex DNA analysis based upon Raman spectroscopy Cady, Nathaniel C.; Lednev , Igor K.
R2-03-06 Novel biosensor using living cells on silicon-based microarrays Castracane, James

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Physics

Case Number Disclosure Title Inventor(s)
RN2-11-16
Carbon nanotube growth on silicon and silicon nanowire substrates via simultaneous delivery of carbon and catalyst via plasma enhanced atomic layer deposition (PEALD)
Jae Ho Lee; Issac Lund; Eric Eisenbraun;  Robert Geer
RN2-09-16 Method of creating Cs-free III-Nitride based Photocathodes Shahedipour-Sandvik, Fatemeh; Tripathi, Neeraj
RN2-09-08 Bandgap Engineering in Mono-and Multi-layer Graphene via formation of Interface charges Shahedipour-Sandvik, Fatemeh
RN2-09-01A Spatial Tuneable Pressure Plates for bonding wafer to wafer/die to wafer applications Altemus, Bruce
RN2-09-01 Piezoelectric Sensor Array for Pressure Uniformity/Spatial Verification Altemus, Bruce
R2-08-21 Multi-value resistive memory by utilizing metallic and ionic filaments in parrallel Wang, Wei
R2-08-16 Split gate method for MOSFET Wang, Wei; Hartley, John
R2-08-15 Digital Deflection system for Changed Particle Applications Hartley, John
R2-08-14 Porous Micro-Heater for Surface Dusruption and Controllled Sampling of Fluids Gadre, Anand
R2-08-10 Nano/Viral Sensor Conjugated Polymeric Non-Invasive Nanosensor for Viral Dectection Gadre, Anand
R2-08-09 Sticksensor Minimally invasive nanosensor for Continuous Monitoring of Bioanalysis Gadre, Anand
R2-08-07 A Novel Method to Enhance 1.54um near infrared light emmision from Erbium doped silicon Mengbing, Huang; Naczas, Sebastian
R2-05-03 Above Room temperature Ferromagnetic Silicon LaBella, Vincent Patrick; Bolduc, Martin ; Awo-Affouda, Chaffra; Huang, Mengbing
R2-02-04 Substrate Engineering Technique for Low Dislocation Defect III-Nitride Wideband Gap Material (AllnGaN) Growth on Silicon Substrate Shahedipour-Sandvik, Fatemeh; Wu, Di, Kahn, Muhammad Jamil
R2-01-07 A Process for Improving the Integrability of Porous Materials Eisenbraun, Eric

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Surface Science

Case Number Disclosure Title Inventor(s)
RN2-12-07
Method for reducing charging in the CD SEM
Melvin “Warren” Montgomery, Cecelia Montgomery (SEMATECH), Ben Bunday (SEMATECH)
RN2-11-16
Carbon nanotube growth on silicon and silicon nanowire substrates via simultaneous delivery of carbon and catalyst via plasma enhanced atomic layer deposition (PEALD)
Jae Ho Lee; Issac Lund; Eric Eisenbraun;  Robert Geer
S846-320 Process for Etching, Depositing, and Treating Materials Using a Flowing Afterglow (FA) Plasma Technique Corbett, James W.; Yencha, Andrew J.
S839-320 Process for Focusing Gases to Etch and/or Deposit Materials and Confine Reactions to Localized Sites Corbett, James W.; Gibson, Walter M.; Kaloyeros, Alain E.
S836-320 Process for Making Improved Silicon-Germanium Alloys by Low-Temperature Metal-Organic Chemical Vapor Deposition Kaloyeros, Alain E.; Corbett, James W.; Barbero, Christopher; Toscano, Paul J.
S740-320 Process for the Growth of an Overlayer of Crystalline or Polycrystalline Material Corbett, James W.; Kaloyeros, Alain E.
R2-02-03 Real Time Processing Capillary Electrophoresis Method and Fabrication Using MEMS Technology Dong ,Yan; Xu, Bai; Castracane, James
R99-09-320 Silver Precursors for CVD Processes Welch, John T.;Ngo, Silvana C.;Banger, Kulbinder K.
R99-08-320 MOCVD Processes Using Precursors Based on Organometalloid Ligands Welch, John T., Claessen, Rolf;Banger, Kulbinder K.;Kaloyeros, Alain E.;Toscano, Paul J.;Kornilov, Andrei
R99-07-320 Chemical Source and Processes for Tungsten Nitride Deposition Kaloyeros, Alain
Arkles, Barry
R98-02-320.2 MOCVD Precursors based on Organometalloid Ligands Welch, John T. Claessen, Rolf Banger, Kulbinder K. Toscano, Paul J., Kornilov, Andrei
R98-02-320.1 MOCVD Precursors based on Organometalloid Ligands Welch, John T. Claessen, Rolf Banger, Kulbinder K. Toscano, Paul J., Kornilov, Andrei
R97-04-320 Slicon Based Films Formed from Iodosilane Precursors and Method of Making the Same Kaloyeros, Alain E., Arkles, Barry (Gelest), Chen, Xiaomeng, Endisch, Denis, Lin, Xian
R97-03-320 Silicon Nitrogen-Based Films and Method of Making the Same Kaloyeros, Alain E., Arkles, Barry (Gelest)
R96-04-320.2 Method for Chemical Vapor Deposition of Copper-Based Films and Copper Source Precursors for the Same Kaloyeros , Alain E.; Eisenbraun, Eric T.; Zheng, Bo
R96-04-320.1 Method for Chemical Vapor Deposition of Copper-Based Films and Copper Source Precursors for the Same Kaloyeros, Alain
Arkles, Barry
R905-320 A Universal Chemical Vapor Deposition Process for the Selective Growth of Metals Kaloyeros, Alain E.
R904-320 Process and apparatus for the use of solid precursor sources in liquid form for vapor deposition of materials Kaloyeros , Alain E.; Eisenbraun, Eric T.; Zheng, Bo
R855-320 A Temperature-Controlled Chemical Vapor Deposition (TC-CVD) Process for the Growth of High Temperature Superconductors Kaloyeros, Alain E.; Feng, Aiguo
R743-320 Metal-Organic Vapor Phase Epitaxy (Movpe) of High Temperature Superconductors Kaloyeros, Alain E.; Corbett, James W.
R2-08-18 Fluidic Devices for Cell Encapsulation and methods of Making Same of Biological applications Bergkvist, Magnus; Cady ,Nathaniel; Gracias, Allison; Xie, Yubling
R2-08-03 Environmental X-ray Photoelectron Spectroscopy Theil, Bradley
R2-07-17 High Efficiency Method for Surface Contamination Studies Denbeaux,Gregory; Goodwin,Francis; Garg, Rashi;
R2-07-10 Controloble Surface Roughness Brainard, Robert; Hirschbein, Bernard; Gadre,Anand
R2-06-15 Direct Closed Loop Proportional-Integral- Derivaive (PID) Substraite Temperature Control for a Molecular Beam Epilaxy (MBE) Machine Via Input from a Band-Edge temperature measurement system LaBella, Vincent; Awo-Affouda, Chaffra; Stollenwerk, Andrew
R2-06-01.2 Processes for the Growth of Ruthenium containing layers using Atomic Layer Deposition
Renamed: Ruthenium Precursors and Intermediates for Depostion Processes, Their production and method of use
Renamed: Ruthenium Precursors and Intermediates for Plasma-Enhanched LAD
Eisenbraun, Eric
Li, Min
Berliner, Nathaniel
co-inventors from Honeywell, U. of Iowa and U of Helsinki
R2-06-01.1 Ruthenium Precursors and Intermediates for Plasma-Enhanched LAD Eisenbraun, Eric; Li, Min; Berliner, Nathaniel; co-inventors from Honeywell, U. of Iowa and U of Helsinki
R2-05-23 Oxidation liftoff technology for ultra thin active layer transfere and fabrication of silicon based laser diodes Otkyabrsky, Serge; Yakimov, Michael
R2-03-07 Methods for forming palladium alloy thin films and optical hydrogen sensors employing palladium alloy thin films Carpenter, Michael A.; Zhao, Zhouying
R2-02-07 Oxidation Lift-off method Oktyabrsky, Serge; Yakimov, Micahel
R1183-320 Methodology for In-Situ Doping of Auminum Coatings Kaloyeros, Alain E., Knorr, Andreas, Faltermeier, Jonathan
R1145-320 Conformal Pure and Doped Aluminum Coatings and a Methodology and Apparatus for their Preparation Kaloyeros, Alain E., Faltermeier, Jonathan
R1143-320.2 Tantalum and Tantalum-Based Films Formed Using Flourine-Containing Source Precursors and Methods of Making the Same Kaloyeros, Alain
Arkles, Barry
R1143-320.1 Tantalum and Tantalum-Based Films and Methods of Making the Same Kaloyeros, Alain; Arkles, Barry

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